Blank Cover Image

LASER-INDUCED CHEMICAL VAPOR DEPOSITION OF SILICON NITRIDE FILMS

著者名:
掲載資料名:
Laser-controlled chemical processing of surfaces : symposium held November 1983 in Boston, Massachusetts, U.S.A.
シリーズ名:
Materials Research Society symposium proceedings
シリーズ巻号:
29
発行年:
1984
開始ページ:
61
終了ページ:
66
総ページ数:
6
出版情報:
New York: North-Holland
ISSN:
02729172
ISBN:
9780444008947 [0444008942]
言語:
英語
請求記号:
M23500/29
資料種別:
国際会議録

類似資料:

1 国際会議録 CHEMICAL VAPOR DEPOSITION OF SILICON INSULATING FILMS INDUCED WITH PERPENDICULAR ELECTRON BEAM

Zarnani, H., Rocca, J. J., Bishop, D., Cody, N. W., Collins, G. J.

Materials Research Society
7 国際会議録 Silicon Nitride Films Deposited by Atmospheric Pressure Chemical Vapor Deposition

Lin, Xian, Endisch, Denis, Chen, Xiaomeng, Kaloyeros, Alain, Arkles, Barry

MRS - Materials Research Society
2 国際会議録 Excimer-laser-induced chemical vapor deposition of boron nitride films from borazine

M.V. Ugarov, V.P. Ageev, V.I. Konov

Society of Photo-optical Instrumentation Engineers
8 国際会議録 QUASI-STOICHIOMETRIC SILICON NITRIDE THIN FILMS DEPOSITED BY REMOTE PLASMA-ENHANCED CHEMICAL-VAPOR DEPOSITION

Lucovsky, G., Ma, Y., He, S.S., Yasuda, T., Stephens, D.J., Habermehl, S.

Materials Research Society
3 国際会議録 COPPER LASER INDUCED CHEMICAL VAPOR DEPOSITION OF Al FILMS

Yankova, M.I., Shanov, W., Ivanov, B.

Materials Research Society
9 国際会議録 Pulsed-laser deposition of boron nitride films on silicon

R. Schmauder, G. Dodel, G. Bilger

Society of Photo-optical Instrumentation Engineers
4 国際会議録 Bonding of Hydrogen and Deuterium in Silicon Nitride Films Prepared by Remote Plasma Enhanced Chemical Vapor Deposition

Stevens, G., Santos-Filho, P., Habermehl, S., Lucovsky, G.

MRS - Materials Research Society
10 国際会議録 Metalorganic Chemical Vapor Deposition of Aluminum Oxide on Silicon Nitride

Dasgupta, Anindya, Chowdhuri, Abhijit Roy, Takoudis, Christos G.

Materials Research Society
5 国際会議録 Hydrogen Assisted Remote Plasma Enhanced Chemical Vapor Deposition of Amorphous Silicon Nitride Films

Santos-Filho, P., Koh, K., Stevens, G., Lucovsky, G.

MRS - Materials Research Society
11 国際会議録 Gate-Quality Silicon Nitride Films On Silicon By Jet Vapor Deposition

Wang, X., Ma, T.P., Cui, G.-J., Tamagawa, T., Golz, J.W., Schmitt, J.J., Halpern, B.L.

Electrochemical Society
6 国際会議録 In-Situ Raman Spectroscopy During Laser-Induced Chemical Vapor Deposition of Silicon and Silicon Carbonitride Thin Films

Besling, W.F.A., Goossens, A., Schoonman, J.

Electrochemical Society
12 国際会議録 ATMOSPHERIC PRESSURE CHEMICAL VAPOR DEPOSITION OF GALLIUM NITRIDE THIN FILMS

Gordon, Roy G., Hoffman, David M., Riaz, Umar

Materials Research Society
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12