Blank Cover Image

THE INFLUENCE OF IMPLANTATION CONDITIONS AND TARGET ORIENTATION IN HIGH DOSE IMPLANTATION OF A1+ INTO Si

著者名:
Namavar, F.
Budnick, J. I
Fasihuddin, A.
Hayden, H. C.
Pease, D. A.
Otter, F. A.
Patarini, V.
さらに 2 件
掲載資料名:
Ion implantation and ion beam processing of materials : symposium held November 1983 in Boston, Massachusetts, U.S.A.
シリーズ名:
Materials Research Society symposium proceedings
シリーズ巻号:
27
発行年:
1984
開始ページ:
347
終了ページ:
352
総ページ数:
6
出版情報:
New York: North-Holland
ISSN:
02729172
ISBN:
9780444008695 [0444008691]
言語:
英語
請求記号:
M23500/27
資料種別:
国際会議録

類似資料:

1 国際会議録 STUDY OF NEAR SURFACE STRUCTURE AND COMPOSITION FOR HIGH DOSE IMPLANTATION OF Cr+ INTO Si

Namavar, F., Budnick, J. I, Hayden, H.C., Otter, F. A., Patarini, V.

North-Holland
7 国際会議録 FORMATION OP BURIED Si02 BY HIGH DOSE IMPLANTATION OF OXYGEN AT RODM AND LIQUID NITROGEN TEMPERATURES

Namavar, F., Budnick, J.I., Sanchez, F.H., Hayden, H.C.

Materials Research Society
2 国際会議録 SYSTEMATIC OF SILICIDE FORMATION BY HIGH DOSE IMPLANTATION OF TRANSITION METALS INTO Si

Namavar, F., Sanchez, F.H., Budnick, J.I., Fasihuddin, A.H., Hayden, H.C.

Materials Research Society
8 国際会議録 ON THE FORMATIUON OF Si OXIDE BY ION IMPLANTATION

Namavar, F., Budnick, J. I., Sanchez, F. H., Hayden, H. C.

Materials Research Society
3 国際会議録 STUDY OF DOSE AND DOSE RATE IN THE IMPLANTATION OF NITROGEN ISOTOPES INTO Si(100)

Namavar, F., Budnick, J.I., Fasihuddin, A., Sanchez, F.H., Hayden, H.C.

Materials Research Society
9 国際会議録 SILICIDE FORMATION IN HIGH-DOSE Fe-IMPLANTED SILICON

Tan, Z., Namavar, F., Heald, S.M., Budnick, J. I., Sanchez, F. H.

Materials Research Society
4 国際会議録 EXAFS STUDIES OF COBALT SILICIDE FORMATION PRODUCED BY HIGH DOSE ION IMPLANTATION

Tan, Z., Budnick, J. I., Sanchez, F., Tourillon, G., Namavar, F., Hayden, H., Fasihuddin, A. F.

Materials Research Society
10 国際会議録 Chemical profiling and structural studies of ion-beam-mixed aluminum on silicon

Namavar, F., Budnick, J. I., Otter, F. A.

North-Holland
5 国際会議録 GETTERING OF IMPURITIES DURING HIGH DOSE IMPLANTATION OF Al OR Cr INTO Si AND THE RESULTING EFFECT ON STRUCTURE AND COMPOSITION

namavar, F., Budnick, J. I., Otter, F. A.

Materials Research Society
11 国際会議録 STRAIN RELIEF AND DEFECT FORMATION IN HIGH DOSE OXYGEN IMPLANTED SILICON

Venables, D., Jones, K. S., Namavar, F., Manke, J. M.

Materials Research Society
6 国際会議録 SILICIDE FORMATION BY HIGH DOSE TRANSITION METAL IMPLANTS INTO Si

Sanchez, F.H., Namavar, F., Budnick, J.I., Fasihudin, A., Hayden, H.C.

Materials Research Society
12 国際会議録 HIGH DOSE RATE OXYGEN IMPLANTATION FOR FORMATION OF SILICON-ON-INSULATOR STRUCTURES

Cortesi, E., Namavar, F., Pinizzotto, R.F., Yang, H.

Materials Research Society
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12