CHARACTERIZATION OF DEVICE GRADE SOI STRUCTURES FORMED BY IMPLANTATION OF HIGH DOSES OXYGEN
- 著者名:
Hemment, P. L. F. Maydell-Ondrusz, E. A. Stephens, K. G. Arrowsmith, R. P. Glaccum, A> C. Kilner, J. A. Butcher, J. B. - 掲載資料名:
- Ion implantation and ion beam processing of materials : symposium held November 1983 in Boston, Massachusetts, U.S.A.
- シリーズ名:
- Materials Research Society symposium proceedings
- シリーズ巻号:
- 27
- 発行年:
- 1984
- 開始ページ:
- 281
- 終了ページ:
- 286
- 総ページ数:
- 6
- 出版情報:
- New York: North-Holland
- ISSN:
- 02729172
- ISBN:
- 9780444008695 [0444008691]
- 言語:
- 英語
- 請求記号:
- M23500/27
- 資料種別:
- 国際会議録
類似資料:
Materials Research Society |
Electrochemical Society |
Materials Research Society | |
Materials Research Society |
North-Holland |
North Holland |
Electrochemical Society |
Materials Research Society | |
6
国際会議録
CHARACTERIZATION AND EVOLUTION OF MICROSTRUCTURES FORMED BY HIGH DOSE OXYGEN IMPLANTATION OF SILICON
Materials Research Society |
Trans Tech Publications |