Blank Cover Image

Electromigration in Al and Al-alloy thin-film conductors

著者名:
掲載資料名:
Thin films and interfaces II : symposium held November 1983, in Boston, Massachusetts, U.S.A.
シリーズ名:
Materials Research Society symposium proceedings
シリーズ巻号:
25
発行年:
1984
開始ページ:
581
終了ページ:
586
総ページ数:
6
出版情報:
New York: North-Holland
ISSN:
02729172
ISBN:
9780444009050 [0444009051]
言語:
英語
請求記号:
M23500/25
資料種別:
国際会議録

類似資料:

1 国際会議録 ELECTROMIGRATION LIFETIME AND STEP COVERAGE IN Al/Cu/Si THIN FILM CONDUCTORS

Kisselgof, Larisa, Elliott, L. J., Maziarz, J. J., Lloyd, J. R.

Materials Research Society
7 国際会議録 Local Electromechanical Properties of ZnO Thin Films and Microcrystals

I.K. Bdikin, M. Silibin, R. Ayouchi, R. Schwarz, S. Gavrilov, J. Gracio, A.L. Kholkin

Materials Research Society
2 国際会議録 *ELECTROMIGRATION FAILURE AND MECHANICAL STRESS IN THIN FILM CONDUCTORS

Lloyd, J. R.

Materials Research Society
8 国際会議録 *PULSED LASER DEPOSITION OF HIGH Tc SUPERCONDUCTING THIN FILMS: PRESENT AND FUTURE

Du, X. D., Venkatesan, T., Inam, A., Xi, X. X., Li, Q., McLean, W. L., Chang, C. C., Hwang, D. M., Ramesh, R., Nazar, …

Materials Research Society
3 国際会議録 Interfacial Effects on Electromigration Kinetics

SCHWARTZ, J. A., FELTON, L. E.

American Institute of Chemical Engineers
9 国際会議録 Activation Energy of Electromigration in Copper Thin Film Conductor Lines

Gladkikh, A., Lereah, Y., Karpovski, M., Palevski, A., Kaganovskii, Yu. S.

MRS - Materials Research Society
4 国際会議録 ELECTROMIGRATION INDUCED RESISTANCE CHANGES IN PASSIVATED ALUMINUM THIN FILM CONDUCTORS

Mockl, U. E., Lloyd, J. R., Arzt, E.

MRS - Materials Research Society
10 国際会議録 Activation Energy of Electromigration in Copper Thin Film Conductor Lines

Gladkikh, A., Lereah, Y., Karpovski, M., Palevski, A., Kaganovskii, Yu, S.

MRS - Materials Research Society
5 国際会議録 The Role of Metal and Passivation Defects in Electromigration-Induced Damage in Thin Film Conductors

Lloyd, J. R., Smith, P. M., Prokop, G. S.

North-Holland
11 国際会議録 *STRESS AND ELECTROMIGRATION IN THIN FILM METALLISATION

Ross, R. A.

Materials Research Society
6 国際会議録 THE EFFECT OF Cu ALLOYING ON Al ALLOY THIN FILMS: MICROSTRUCTURAL MECHANISMS THAT ENHANCE ELECTROMIGRATION RESISTANCE

Frear, D. R., Michael, J. R., Romig, A. D., Jr.

MRS - Materials Research Society
12 国際会議録 IN-SITU TEM OBSERVATION OF ELECTROMIGRATION DAMAGE BY SURFACE OR INTERFACE DIFFUSION IN Al AND Al ALLOY FILMS

Chang, C. Y., Vook, R. W.

Materials Research Society
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12