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TiN as a diffusion barrier for III-V metallization

著者名:
Houghton, D. C.  
掲載資料名:
Thin films and interfaces II : symposium held November 1983, in Boston, Massachusetts, U.S.A.
シリーズ名:
Materials Research Society symposium proceedings
シリーズ巻号:
25
発行年:
1984
開始ページ:
149
終了ページ:
156
総ページ数:
8
出版情報:
New York: North-Holland
ISSN:
02729172
ISBN:
9780444009050 [0444009051]
言語:
英語
請求記号:
M23500/25
資料種別:
国際会議録

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