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TRANSIENT ANNEALING OF ION-IMPLANTED SILICON USING A SCANNING IR LINE SOURCE

著者名:
掲載資料名:
Laser-solid interactions and transient thermal processing of materials : symposium held November 1982 in Boston, Massachusetts, U.S.A.
シリーズ名:
Materials Research Society symposium proceedings
シリーズ巻号:
13
発行年:
1983
開始ページ:
425
終了ページ:
430
総ページ数:
6
出版情報:
New York: North-Holland
ISSN:
02729172
ISBN:
9780444007889 [0444007881]
言語:
英語
請求記号:
M23500/13
資料種別:
国際会議録

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