High-k hafnium silicate films on silicon and germanium wafers by MOCVD using single-source precursor

High-k hafnium silicate films on silicon and germanium wafers by MOCVD using single-source precursor

著者名:

Lemberger, M.

掲載資料名:

EUROCVD-15, fifteenth European Conference on Chemical Vapor Deposition : proceedings of the international symposium

シリーズ名:

Electrochemical Society Proceedings Series

シリーズ巻号:

2005-09

発行年:

2005

開始ページ:

873

終了ページ:

880

総ページ数:

8

出版情報:

Pennington, NJ: Electrochemical Society

ISSN:

01616374

ISBN:

9781566774277 [1566774276]

言語:

英語

請求記号:

E23400/200509

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00015392
シリーズID:	PA00000028
会議名:	European Conference on Chemical Vapor Deposition - EUROCVD
回次:	15th
会議開催地:	Bochum, Germany
会議開催年:	2005.09.05-2005.09.09

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