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Numerical simulation of SiC processes: A characterization tool for the design of epitaxial structures in electronics

著者名:
Pans, M.
Nishizawa, S.
Wettmann, P.
Ucar, M.
Blanquet, E.
Dedulle, J. M.
Baillet, F.
Chaussende, D.
Bernard, C.
Madar, R.
さらに 5 件
掲載資料名:
EUROCVD-15, fifteenth European Conference on Chemical Vapor Deposition : proceedings of the international symposium
シリーズ名:
Electrochemical Society Proceedings Series
シリーズ巻号:
2005-09
発行年:
2005
開始ページ:
1
終了ページ:
12
総ページ数:
12
出版情報:
Pennington, NJ: Electrochemical Society
ISSN:
01616374
ISBN:
9781566774277 [1566774276]
言語:
英語
請求記号:
E23400/200509
資料種別:
国際会議録

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