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Strain Engineering for Si CMOS Technology (Invited paper)

著者名:
Sadana, D. K.
Bedell, S. W.
Reznicek, A.
de Souza, J.P.
Fogel, K.
Hovel, H.
さらに 1 件
掲載資料名:
ULSI Process Integration : proceedings of the International Symposium
シリーズ名:
Electrochemical Society Proceedings Series
シリーズ巻号:
2005-06
発行年:
2005
開始ページ:
360
終了ページ:
384
総ページ数:
25
出版情報:
Pennington, N.J.: Electrochemical Society
ISSN:
01616374
ISBN:
9781566774642 [1566774640]
言語:
英語
請求記号:
E23400/200506
資料種別:
国際会議録

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