64 Si:C Epitaxial Wafer for Improved Sub-100nm CMOS Transistor Performance
- 著者名:
Standley, R. Mansoori, M. Miles, D. Chakravarthi, S. Seacrist, M. Wise, R. Torack, T. Ries, M. - 掲載資料名:
- Advanced gate stack, source/drain and channel engineering for Si-based CMOS, new materials, processes, and equipment : proceedings of the international symposium
- シリーズ名:
- Electrochemical Society Proceedings Series
- シリーズ巻号:
- 2005-05
- 発行年:
- 2005
- 開始ページ:
- 535
- 終了ページ:
- 541
- 総ページ数:
- 7
- 出版情報:
- Pennington, NJ: Electrochemical Society
- ISSN:
- 01616374
- ISBN:
- 9781566774635 [1566774632]
- 言語:
- 英語
- 請求記号:
- E23400/200505
- 資料種別:
- 国際会議録
類似資料:
Electrochemical Society |
7
国際会議録
Experimental determination of the impact of polysilicon LER on sub-100-nm transistor performance
SPIE-The International Society for Optical Engineering |
Electrochemical Society |
Electrochemical Society |
Electrochemical Society |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
5
国際会議録
(3.6) 5:20 - 5:40 PM - Epitaxially Strained SiGe Process to Improve Mobility in the PMOS Transistor
Electrochemical Society |
Electrochemical Society |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |