28 Self-aligned PtSi Fully Silicided (FUST) Metal Gates for 45 nm CMOS Applications
- 著者名:
van Dal, M.J.H. Lauwers, A. Cunniffe, J. Verbeeck, R. Vrancken, C. Demeurisse, C. Dao, T. Tamminga, Y. Veloso, A. Kittl, J.A. Maex, K. - 掲載資料名:
- Advanced gate stack, source/drain and channel engineering for Si-based CMOS, new materials, processes, and equipment : proceedings of the international symposium
- シリーズ名:
- Electrochemical Society Proceedings Series
- シリーズ巻号:
- 2005-05
- 発行年:
- 2005
- 開始ページ:
- 233
- 終了ページ:
- 240
- 総ページ数:
- 8
- 出版情報:
- Pennington, NJ: Electrochemical Society
- ISSN:
- 01616374
- ISBN:
- 9781566774635 [1566774632]
- 言語:
- 英語
- 請求記号:
- E23400/200505
- 資料種別:
- 国際会議録
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11
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Linewidth Dependence Of The Reverse Bias Junction Leakage For Co-Silicided Source/Drain Junctions
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