24 Effect of Thin Metal Layers on the Work Function of Polysilicon-Metal Electrode Stacks
- 著者名:
Alshareef, H. Wen, H.-C. Choi, K. Harris, R. Lysaght, P. Luan, H. Majhi, P. Lee, B.H. - 掲載資料名:
- Advanced gate stack, source/drain and channel engineering for Si-based CMOS, new materials, processes, and equipment : proceedings of the international symposium
- シリーズ名:
- Electrochemical Society Proceedings Series
- シリーズ巻号:
- 2005-05
- 発行年:
- 2005
- 開始ページ:
- 198
- 終了ページ:
- 206
- 総ページ数:
- 9
- 出版情報:
- Pennington, NJ: Electrochemical Society
- ISSN:
- 01616374
- ISBN:
- 9781566774635 [1566774632]
- 言語:
- 英語
- 請求記号:
- E23400/200505
- 資料種別:
- 国際会議録
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10
国際会議録
Experimental Study of Etched Back Thermal Oxide for Optimization of the Si/High-k Interface
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