16 Properties of HfTaxOy High-K Layers Deposited by ALCVD
- 著者名:
Zhao, C. Rittersma, Z. M. Van Berkum, J. G. M. Snijders, J. H. M. Hendriks, A. Breimer, P. Groat, P. Maes, J. W. Wittesr, H. Afanas'ev, V. V. Tois, E. Tuominen, M. Caymax, M. De Gendt, S. Heyns, M. - 掲載資料名:
- Advanced gate stack, source/drain and channel engineering for Si-based CMOS, new materials, processes, and equipment : proceedings of the international symposium
- シリーズ名:
- Electrochemical Society Proceedings Series
- シリーズ巻号:
- 2005-05
- 発行年:
- 2005
- 開始ページ:
- 133
- 終了ページ:
- 140
- 総ページ数:
- 8
- 出版情報:
- Pennington, NJ: Electrochemical Society
- ISSN:
- 01616374
- ISBN:
- 9781566774635 [1566774632]
- 言語:
- 英語
- 請求記号:
- E23400/200505
- 資料種別:
- 国際会議録
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