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Process Effects and Characterization of Hf-Based Dielectrics

著者名:
Lee, J.C.
Rhee, S.
Kang, C.
Choi, C.
Krishnan, S.
Ok, I.
Akbar, M.
Kim, H.
Zhu, F.
Zhang, M.
Lee, T.
さらに 6 件
掲載資料名:
Silicon nitride, silicon dioxide thin insulating films, and other emerging dieletrics VIII : proceedings of the international symposium
シリーズ名:
Electrochemical Society Proceedings Series
シリーズ巻号:
2005-01
発行年:
2005
開始ページ:
389
終了ページ:
402
総ページ数:
14
出版情報:
Pennington, N.J.: Electrochemical Society
ISSN:
01616374
ISBN:
9781566774598 [1566774594]
言語:
英語
請求記号:
E23400/200501
資料種別:
国際会議録

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