Modeling Chlorine-Activated Diamond Formation in a Chemical Vapor Deposition Reactor

Modeling Chlorine-Activated Diamond Formation in a Chemical Vapor Deposition Reactor

著者名:

Badgwell, T.A. ( Rice University, Houston, TX )
Kassmann, D.E. ( Rice University, Houston, TX )
Pan, C. ( Rice University, Houston, TX )
Hague, R.H. ( Rice University, Houston, TX )

掲載資料名:

AIchE 1994 Annual Meeting : November 13-18 San Francisco Hilton and Towers Hotel, San Francisco, California

シリーズ名:

AIChE meeting [papers]

シリーズ巻号:

1994

発行年:

1994

ペーパー番号:

19d

総ページ数:

8

出版情報:

New York: American Institute of Chemical Engineers

言語:

英語

請求記号:

A08000/950031

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00015159
シリーズID:	PA00000179
会議名:	AIChE Annual Meeting
回次:	1994
会議開催地:	San Francisco, CA, USA
会議開催年:	1994.11.13-1994.11.18
論文注記:	Fiche 1

類似資料:

1 国際会議録 Modeling and Optimization of Chlorine-Activated Diamond Chemical Vapor Deposition Joe, R., Badgwell, T., Hauge, R. American Institute of Chemical Engineers	7 国際会議録 CHEMICAL VAPOR DEPOSITION OF GOLD Larson, C.E., Baum, T.H., Jackson, R.L. Materials Research Society
2 国際会議録 Interior Point Methods in Robust Model Predictive Control Kassmann, D., Badgwell, T. American Institute of Chemical Engineers	8 国際会議録 Uniform Deposition of Chemical Vapor Deposition Diamond Films on Slender Tungsten Wires X.C. Wang, X.T. Shen, T.Q. Zhao, F.H. Sun, B. Shen Trans Tech Publications
3 国際会議録 CHLORINE-ASSISTED CHEMICAL VAPOR DEPOSITION OF DIAMOND FILMS AT LOW TEMPERATURES Komplin, N.J., Bai, B.J., Chu, C.J., Margrave, J.L., Hauge, R.H. Electrochemical Society	9 国際会議録 Effect of Argon during Diamond Deposition by Hot Filament Chemical Vapor Deposition D.C. Barbosa, U.A. Mengui, M.R. Baldan, V.J. Trava-Airoldi, E.J. Corat Trans Tech Publications
4 国際会議録 CHEMICAl VAPOR DEPOSITION OF DIAMOND USING FULLERENES FOR DIAMOND NUCLEATION AND GROWTh PRECURSORS Pan, C., Withers, J.C., Stoessel, C.H., Loulfy, R.O. Electrochemical Society	10 国際会議録 LOW TEMPERATURE SYNTHESIS OF POLYCRYSTALLINE DIAMOND BY MICROWAVE PLASME-ENHANCED CHEMICAL VAPOR DEPOSITION Ramesham,. R.., Ellis, C., Roppel, T., Jaworske, D. A., Baugh, W. Materials Research Society
5 国際会議録 Cleaning Process for Using Chlorine Trifluoride Gas Silicon Carbide Chemical Vapor Deposition Reactor H. Habuka, Y. Fukumoto, K. Mizuno, Y. Ishida, T. Ohno Trans Tech Publications	11 国際会議録 COMBINING MOLECULAR DYNAMICS AND MONTE CARLO SIMULATIONS TO MODEL CHEMICAL VAPOR DEPOSITION: APPLICATION TO DIAMOND Brenner, D.W., Robertson, D.H., Carty, R.J., Srivastava, D., Garrison, B.J. Materials Research Society
6 国際会議録 Improved Chemical Vapor Deposition of Diamond Layers on Cemented Carbides by Formation of Tungsten-Cohalt-Boron Phases in the Interface Region Cremer, R., Mueller, J., Neuschultz, D., Leyendecker, T., Lemmer, O., Frank, M., Gussone, J. Electrochemical Society	12 国際会議録 Influence of Substrate Placement on Plasma-Assisted Chemical Vapor Deposition of Diamond Koemtzopoulos, C.R., Economou, D.J., Pollard, R. American Institute of Chemical Engineers

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