Fabrication and Characterization of Sub-100 nm Ge Wires on Si by e-beam Evaporation and e-beam Lithography

Fabrication and Characterization of Sub-100 nm Ge Wires on Si by e-beam Evaporation and e-beam Lithography

著者名:

Deng, C. ( University of Oregon, Eugene, OR; Oregon Graduate Institute, Portland, OR )

Wu, J.C. ( University of Oregon, Eugene, OR; Oregon Graduate Institute, Portland, OR )

Lantz, S. ( University of Oregon, Eugene, OR; Oregon Graduate Institute, Portland, OR )

Barbero, C.J. ( University of Oregon, Eugene, OR; Oregon Graduate Institute, Portland, OR )

Sigmon, T.W. ( University of Oregon, Eugene, OR; Oregon Graduate Institute, Portland, OR )

Wybourne, M.N. ( University of Oregon, Eugene, OR; Oregon Graduate Institute, Portland, OR )

さらに 1 件

掲載資料名:

AIchE 1994 Annual Meeting : November 13-18 San Francisco Hilton and Towers Hotel, San Francisco, California

シリーズ名:

AIChE meeting [papers]

シリーズ巻号:

1994

発行年:

1994

ペーパー番号:

17a

総ページ数:

7

出版情報:

New York: American Institute of Chemical Engineers

言語:

英語

請求記号:

A08000/950031

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00015159
シリーズID:	PA00000179
会議名:	AIChE Annual Meeting
回次:	1994
会議開催地:	San Francisco, CA, USA
会議開催年:	1994.11.13-1994.11.18
論文注記:	Fiche 3

類似資料:

1 国際会議録 Formation of Sub- 100 nm Ge Wires on Si by E-Beam Evaporation/Lithography Deng, C., Wu, J. C., Barbero, C. J., Sigmon, T. W., Wybourne, M. N. MRS - Materials Research Society	7 国際会議録 Sub-100-nm imaging in x-ray lithography Vladimirsky,O., Dandekar,N.V., Jiang,W., Leonard,Q.J., Simon,K., Bollepalii,B.S., Vladimirsky,Y., Taylor,J.W. SPIE - The International Society for Optical Engineering
2 国際会議録 Surface Evolution in a Pulsed Laser Induced Epitaxy Process of Submicron SiGe Wires Deng, C., Sigmon, T.W., Wu, J.C., Wybourne, M.N. Electrochemical Society	8 国際会議録 Step and flash imprint lithography for sub-100-nm patterning Colburn,M., Grot,A., Amistoso,M.N., Choi,B.J., Bailey,T.C., Ekerdt,J.G., Sreenivasan,S.V., Hollenhorst,J., Willson,C.G. SPIE - The International Society for Optical Engineering
3 国際会議録 Silicide formation using laser and electron beams Sigmon, T.W. North Holland	9 国際会議録 A raster multibeam lithography tool for sub-100-nm mask fabrication utilizing a novel photocathode Maldonado, J.R., Coyle, S.T., Shamoun, B., Yu, M., Thomas, T.N., Holmgren, D.E., Chen, X., DeVore, B., Scheinfein, M.R., … SPIE - The International Society of Optical Engineering
4 国際会議録 Application of chromeless phase-shift masks to sub-100-nm SOI CMOS transistor fabrication Fritze,M., Burns,J.M., Wyatt,P.W., Astolfi,D.K., Forte,T., Yost,D., Davis,P., Curtis,A.V., Preble,D.M., Cann,S.G., … SPIE - The International Society for Optical Engineering	10 国際会議録 Next-generation 193-nm laser for sub-100-nm lithography Duffey,T.P., Blumenstock,G.M., Fleurov,V.B., Pan,X.J., Newman,P.C., Glatzel,H., Watson,T.A., Erxmeyer,J., … SPIE-The International Society for Optical Engineering
5 国際会議録 CPL mask technology for sub-100-nm contact hole imaging Kasprowicz, B.S., Conley, W.E., Litt, L.C., Van Den Broeke, D.J., Montgomery, P.K., Socha, R.J., Wu, W., Lucas, K.D., … SPIE - The International Society of Optical Engineering	11 国際会議録 *UV LASER PROCESSING OF SEMICONDUCTOR DEVICES Sigmon, T.W. Materials Research Society
6 国際会議録 Potentialities of sub-100-nm optical lithography of alternating and phase-edge phase-shift mask for ArF lithography Koo,S.-S., Kim,H.-B., Yune,H.-S., Hong,J.-S., Paek,S.-W., Eom,T.-S., Ahn,C.-N., Ham,Y.-M., Baik,K.-H., Lee,K.-Y., … SPIE-The International Society for Optical Engineering	12 国際会議録 REAPS technique for printing sub-100-nm trench using KrF lithography Sheu, W.-H., Yang, E.T.C., Yang, T.-H.H. SPIE - The International Society of Optical Engineering

1

2

3

4

5

6

7

8

9

10

11

12