THEORETICAL ANALYSIS OF A ROTATING-DISK CHEMICAL VAPOR DEPOSITION REACTOR

THEORETICAL ANALYSIS OF A ROTATING-DISK CHEMICAL VAPOR DEPOSITION REACTOR

著者名:

Coltrin, Michael E. ( Sandia National Laboratories, Albuquerque, NM 87185 )
Breiland, William G. ( Sandia National Laboratories, Albuquerque, NM 87185 )
Evans, Gregory H. ( Sandia National Laboratories, Livermore, CA 94450 )
Kee, Robert J. ( Sandia National Laboratories, Livermore, CA 94450 )

掲載資料名:

AIChE SPRING MEETING, HOUSTON, TX - MARCH 29-APRIL 2, 1987

シリーズ名:

AIChE meeting [papers]

シリーズ巻号:

1987

発行年:

1987

ペーパー番号:

55a

総ページ数:

5

出版情報:

New York: American Institute of Chemical Engineers

言語:

英語

請求記号:

A08000

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00015138
シリーズID:	PA00000179
会議名:	AIChE Spring Meeting
回次:	1987
会議開催地:	Houston, TX, USA
会議開催年:	1987.03.29-1987.04.02
論文注記:	Fiche 8

類似資料:

1 国際会議録 *LASER PROBES AND NUMERICAL MODELING AS PROCESS DIAGNOSTICS IN CHEMICAL VAPOR DEPOSITION Breiland, William G., Ho, Pauline, Coltrin, Michael E,, Kee, Robert J., Evans, Greg H. Materials Research Society	7 国際会議録 A METHEMATICAL MODEL OF THE GAS-PHASE AND SURFACE CHEMISTRY IN GaAs MOCVD Coltrin, Michael E., Kee, Robert J. Materials Research Society
2 国際会議録 Application of Supercomputers To Model Fluid Transport and Chemical Kinetics in Chemical Vapor Deposition Reactors Kee, Robert J., Evans, Greg H., Coltrin, Michael E. American Chemical Society	8 国際会議録 Rotating disk reactor-low pressure metal organic chemical vapor deposition (MOCVD) of optical films McAleese, John, Provost, L. Gary, Tompa, Gary S., Colibaba-Evulet, Andrei, Gulmac, Nick G., Doyle, John J. MRS-Materials Research Society
3 国際会議録 THEORETICAL MODELING AND LASER DIAGNOSTICS OF SILICON CHEMICAL VAPOR DEPOSITION Coltrin, Michael. E., Breiland, William. G., Ho, Pauline American Institute of Chemical Engineers	9 国際会議録 A Two-Dimensional Numerical Model of Gas Mixing and Deposition in a Rotating Disk CVD Reactor Winters, W.S., Evans, G.H. Electrochemical Society
4 国際会議録 GAS-PHASE SILICON ATOM DENSITIES IN THE CHEMICAL VAPOR DEPOSITION OF SILICON FROM SILANE Coltrin, Michael E., Breiland, William G., Ho, Pauline MRS - Materials Research Society	10 国際会議録 METAL ORGANIC CHEMICAL VAPOR DEPOSITION OF Al AND CuAl ALLOY FILMS IN A VERTICAL, HIGH-SPEED, ROTATING DISK REACTOR Tompa, G.S., Wolak, E., Stall, R.A., George, M.A., Lippitt, M., Norman, John A.T. Materials Research Society
5 国際会議録 Si Atom Density Profiles In a Rotating Disk CVD Reactor Ho, P., Breiland, W.G., Coltrin, M.E. Electrochemical Society	11 国際会議録 A Model for Low Pressure Chemical Vapor Deposition in Batch Furnaces Houf, W.G., Grcar, J.F., Breiland, W.G. Electrochemical Society
6 国際会議録 Chemical Kinetics Models for Semiconductor Processing Coltrin, Michael E., Meeks, Ellen, Grcar, Joseph F., Houf, William G., Kee, Robert J., Creighton, J. Randall MRS - Materials Research Society	12 国際会議録 Sources of the Parasitic Chemical Reactions during AlGaN OMPVE* Creighton, J.R., Breiland, W.G., Coltrin, M.E. Electrochemical Society

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