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Anisotropic etching of dielectrics exposed by high intensity femtosecond pulses

著者名:
  • Juodkazis, S. ( CREST-JST (Japan) and Research Institute for Electronic Science. Hokkaido Univ. (Japan) )
  • Tabuchi, Y. ( The Univ. of Tokushima (Japan) )
  • Ebisui, T. ( The Univ. of Tokushima (Japan) )
  • Matsuo, S. ( The Univ. of Tokushima (Japan) )
  • Misawa, H. ( CREST-JST (Japan) and Research Institute for Electronic Science. Hokkaido Univ. (Japan) )
掲載資料名:
Advanced laser technologies 2004 : 10-15 September, 2004, Rome and Frascati, Italy
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
5850
発行年:
2004
開始ページ:
59
終了ページ:
66
総ページ数:
8
出版情報:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819458476 [0819458473]
言語:
英語
請求記号:
P63600/5850
資料種別:
国際会議録

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