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Nanoscale MOS devices: device parameter fluctuations and low-frequency noise (Invited Paper)

著者名:
  • Wong, H. ( Tokyo Institute of Technology (Japan) and City Univ. (Hong Kong China) )
  • Iwai, H. ( Tokyo Institute of Technology (Japan) )
  • Liou, J. J. ( Univ. of Central Florida (USA) )
掲載資料名:
Noise in devices and circuits III : 24-26 May, 2005, Austin, Texas, USA
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
5844
発行年:
2005
開始ページ:
164
終了ページ:
176
総ページ数:
13
出版情報:
Bellingham, Washington: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819458391 [0819458392]
言語:
英語
請求記号:
P63600/5844
資料種別:
国際会議録

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