Defect printability and inspectability of halftone masks for the 90nm and 70nm node
- 著者名:
Eggers, K. ( Infineon Technologies AG (Germany) ) Gutjahr, K. ( Infineon Technologies AG (Germany) ) Peikert, M. ( Infineon Technologies AG (Germany) ) Rutzinger, D. ( Infineon Technologies AG (Germany) ) Ludwig, R. ( Advanced Mask Technology Ctr. (Germany) ) Kaiser, M. ( Advanced Mask Technology Ctr. (Germany) ) Durr, A. ( Advanced Mask Technology Ctr. (Germany) ) Heumann, J. ( Advanced Mask Technology Ctr. (Germany) ) - 掲載資料名:
- EMLC 2005 : 21st European Mask and Lithography Conference : 31 January-3 February, 2005, Dresden, Germany
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 5835
- 発行年:
- 2005
- 開始ページ:
- 273
- 終了ページ:
- 281
- 総ページ数:
- 9
- 出版情報:
- Bellingham, Wash.,: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819458308 [0819458309]
- 言語:
- 英語
- 請求記号:
- P63600/5835
- 資料種別:
- 国際会議録
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