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Demonstrators: a vital step forward for projection mask-less lithography (PML2)

著者名:
Brandstaetter, C. ( IMS Jena GmbH (Germany) )
Haugeneder, E. ( IMS Jena GmbH (Germany) )
Doering, H.-J. ( Leica Microsystems Lithography GmbH (Germany) )
Elster, T. ( Leica Microsystems Lithography GmbH (Germany) )
Heinitz, J. ( Leica Microsystems Lithography GmbH (Germany) )
Fortagne, O. ( Leica Microsystems Lithography GmbH (Germany) )
Eder-Kapl, S. ( IMS Nanofabrication GmbH (Austria) )
Lammer, G. ( IMS Nanofabrication GmbH (Austria) )
Jochl, P. ( IMS Nanofabrication GmbH (Austria) )
Loeschner, H. ( IMS Nanofabrication GmbH (Austria) )
Reimer, K. ( Fraunhofer Institute for Silicon Technology (Germany) )
Saniter, J. ( Fraunhofer Heinrich Hertz Institute (Germany) )
Talmi, M. ( Fraunhofer Heinrich Hertz Institute (Germany) )
Eberhardt, R. ( Fraunhofer Institute for Optics and Precision Engineering (Germany) )
Kroenert, K. ( Equicon GmbH (Germany) )
さらに 10 件
掲載資料名:
EMLC 2005 : 21st European Mask and Lithography Conference : 31 January-3 February, 2005, Dresden, Germany
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
5835
発行年:
2005
開始ページ:
188
終了ページ:
195
総ページ数:
8
出版情報:
Bellingham, Wash.,: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819458308 [0819458309]
言語:
英語
請求記号:
P63600/5835
資料種別:
国際会議録

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