Progress in 193nm immersion lithography at IMEC
- 著者名:
- Ronse, K. ( IMEC (Belgium) )
- Vandenberghe, G. ( IMEC (Belgium) )
- Hendrickx, E. ( IMEC (Belgium) )
- Leunissen, L. H. A. ( IMEC (Belgium) )
- Aksenov, Y. ( Philips Research Leuven (Belgium) )
- 掲載資料名:
- EMLC 2005 : 21st European Mask and Lithography Conference : 31 January-3 February, 2005, Dresden, Germany
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 5835
- 発行年:
- 2005
- 開始ページ:
- 6
- 終了ページ:
- 12
- 総ページ数:
- 7
- 出版情報:
- Bellingham, Wash.,: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819458308 [0819458309]
- 言語:
- 英語
- 請求記号:
- P63600/5835
- 資料種別:
- 国際会議録
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4
国際会議録
Comparative study of bi-layer attenuating phase-shifting masks for hyper-NA lithography [6283-123]
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |