Relaxation mechanism of SiGe thin film on SOI substrate
- 著者名:
Di, Z. ( Shanghai Institute of Microsystem and Information Technology. CAS (China) and City Univ. of Hong Kong (Hong Kong China) ) Zhang, M. ( Shanghai Institute of Microsystem and Information Technology. CAS (China) ) Liu, W. ( Shanghai Institute of Microsystem and Information Technology. CAS (China) ) Zhu, M. ( Shanghai Institute of Microsystem and Information Technology. CAS (China) and City Univ. of Hong Kong (Hong Kong China) ) Lin, C. ( Shanghai Institute of Microsystem and Information Technology. CAS (China) ) Chu, P. K. ( City Univ. of Hong Kong (Hong Kong China) ) - 掲載資料名:
- Fifth International Conference on Thin Film Physics and Applications : 31 May-2 June, 2004, Shanghai, China
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 5774
- 発行年:
- 2004
- 開始ページ:
- 611
- 終了ページ:
- 615
- 総ページ数:
- 5
- 出版情報:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819457554 [0819457558]
- 言語:
- 英語
- 請求記号:
- P63600/5774
- 資料種別:
- 国際会議録
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