Resolution enhancement in optical lithography using polarized film mask
- 著者名:
- Yu, G. ( Institute of Optics and Electronics, CAS (China) )
- Lin, W. ( Institute of Optics and Electronics, CAS (China) )
- Chen, X. ( Institute of Optics and Electronics, CAS (China) )
- Xing, T. ( Institute of Optics and Electronics, CAS (China) )
- Yao, H. ( Institute of Optics and Electronics, CAS (China) )
- 掲載資料名:
- Fifth International Conference on Thin Film Physics and Applications : 31 May-2 June, 2004, Shanghai, China
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 5774
- 発行年:
- 2004
- 開始ページ:
- 567
- 終了ページ:
- 570
- 総ページ数:
- 4
- 出版情報:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819457554 [0819457558]
- 言語:
- 英語
- 請求記号:
- P63600/5774
- 資料種別:
- 国際会議録
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