20-nm linewidth nanoimprint mold prepared by selectively etched multiplayer thin film
- 著者名:
Zhang, Y. ( Nanjing Univ. (China) and JiLin Normal Univ. (China) ) Han, G. ( Nanjing Univ. (China) ) Huang, X. ( Nanjing Univ. (China) ) Li, W. ( Nanjing Univ. (China) ) Hao, X. ( Nanjing Univ. (China) ) Ma, G. ( Nanjing Univ. (China) ) Chen, K. ( Nanjing Univ. (China) ) - 掲載資料名:
- Fifth International Conference on Thin Film Physics and Applications : 31 May-2 June, 2004, Shanghai, China
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 5774
- 発行年:
- 2004
- 開始ページ:
- 450
- 終了ページ:
- 453
- 総ページ数:
- 4
- 出版情報:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819457554 [0819457558]
- 言語:
- 英語
- 請求記号:
- P63600/5774
- 資料種別:
- 国際会議録
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