Preparation of CoSi2 using microwave hydrogen plasma annealing

Preparation of CoSi2 using microwave hydrogen plasma annealing

著者名:

Wang, T. ( Shanghai Jiao Tong Univ. (China) )
Dai, Y. B. ( Shanghai Jiao Tong Univ. (China) )
Ouyang, S. K. ( Shanghai Jiao Tong Univ. (China) )
Shen, H. S. ( Shanghai Jiao Tong Univ. (China) )
Wu, J. S. ( Shanghai Jiao Tong Univ. (China) )

掲載資料名:

Fifth International Conference on Thin Film Physics and Applications : 31 May-2 June, 2004, Shanghai, China

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

5774

発行年:

2004

開始ページ:

407

終了ページ:

410

総ページ数:

4

出版情報:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819457554 [0819457558]

言語:

英語

請求記号:

P63600/5774

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00015002
シリーズID:	PA00000029
会議名:	International Conference on Thin Film Physics and Applications
回次:	2004 : 5th
会議開催地:	Shanghai, China
会議開催年:	2004.05.31-2004.06.02

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