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Improve the charge stability of SiO2 films by plasma treatment and ion implantation

著者名:
  • Yuan, N. ( Jiangsu Polytechnic Univ. (China) )
  • Li, J. ( Jiangsu Polytechnic Univ. (China) )
掲載資料名:
Fifth International Conference on Thin Film Physics and Applications : 31 May-2 June, 2004, Shanghai, China
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
5774
発行年:
2004
開始ページ:
78
終了ページ:
81
総ページ数:
4
出版情報:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819457554 [0819457558]
言語:
英語
請求記号:
P63600/5774
資料種別:
国際会議録

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