Investigation of model-based physical design restrictions(Invited Paper)

Investigation of model-based physical design restrictions(Invited Paper)

著者名:

Lucas, K. ( Freescale Semiconductor(France) )

Baron, S. ( STMicroelectronics(France) )

Belledent, J. ( Philips Semiconductor(France) )

Boone, R. ( Freescale Semiconductor(France) )

Borjon, A. ( Philips Semiconductor(France) )

Couderc, C. ( Philips Semiconductor(France) )

Patterson, K. ( Freescale Semiconductor(France) )

Riviere-Cazaux, L. ( Freescale Semiconductor(France) )

Rody, Y. ( Philips Semiconductor(France) )

Sundermann, F. ( STMicroelectronics(France) )

Toublan, O. ( Mentor Graphics Europe(France) )

Trouiller, Y. ( CEA-LETI(France) )

Urbani, J. -C. ( STMicroelectronics(France) )

Wimmer, K. ( Freescale Semiconductor(France) )

さらに 9 件

掲載資料名:

Design and process integration for microelectronic manufacturing III : 3-4 March 2005, San Jose, California, USA

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

5756

発行年:

2005

開始ページ:

85

終了ページ:

96

総ページ数:

12

出版情報:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819457363 [0819457361]

言語:

英語

請求記号:

P63600/5756

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00014983
シリーズID:	PA00000029
会議名:	SPIE Advanced Lithography : Data analysis and modeling for process control
回次:	2005 : 3rd
会議開催地:	San Jose, CA, USA
会議開催年:	2005.03.03-2005.03.04

類似資料:

1 国際会議録 Improving model-based OPC performance for the 65-nm node through calibration set optimization Patterson, K., Trouiller, Y., Lucas, K., Belledent, J., Borjon, A., Rody, Y., Couderc, C., Sundermann, F., Urbani, J. … SPIE - The International Society of Optical Engineering	7 国際会議録 Through-process window resist modelling strategies for the 65 nm node [5992-46] Borjon, A., Belledent, J., Troullier, Y., Patterson, K., Lucas, K., Couderc, C., Sundermann, F., Urbani, J. -C., Baron, … SPIE - The International Society of Optical Engineering
2 国際会議録 Modeling of electromagnetic effects from mask topography at full-chip scale Borjon, A., Belledent, J., Shang, S. D., Toublan, O., Miramond, C., Patterson, K., Lucas, K., Couderc, C., Rody, Y., … SPIE - The International Society of Optical Engineering	8 国際会議録 High accuracy 65nm OPC verification: full process window model vs. critical failure ORC Amandine Borjon, Jerome Belledent, Shumay D. Shang, Olivier Toublan, Corinne Miramond, Kyle Patterson, Kevin Lucas, … SPIE - The International Society of Optical Engineering
3 国際会議録 Dual layer patterning failures in complex RET processes using ORC tools and pre- or post-optical proximity correction strategy [5853-100] Couderc, C., Belledent, J., Borjon, A., Trouiller, Y., Sundermann, F., Lucas, K., Urbani, J.C., Foussadier, F., Rody, … SPIE - The International Society of Optical Engineering	9 国際会議録 Sensitivity of a variable threshold model toward process and modeling parameters [6349-44] Saied, M., Foussadier, F., Trouiller, Y., Belledent, J., Lucas, K., Schanen, I., Borjon, A., Couderc, C., Gardin, C., … SPIE - The International Society of Optical Engineering
4 国際会議録 Correction of long-range effects applied to the 65-nm node [5853-107] Belledent, J., Word, J., Trouiller, Y., Couderc, C., Miramond, C., Toublan, O., Chapon, J.-D., Baron, S., Borjon, A., … SPIE - The International Society of Optical Engineering	10 国際会議録 Closing the defect printability loop: optimizing defect specifications for an established lithographic process Patterson, K., Wakefield, C., Sixt, P., Sundermann, F., Trouiller, Y., Belledent, J., Couderc, C., Rody, Y., Lucas, K. SPIE - The International Society of Optical Engineering
5 国際会議録 65nm OPC and design optimization by using simple electrical transistor simulation Trouiller, Y., Devoivre, T., Belledent, J., Foussadier, F., Borjon, A., Patterson, K., Lucas, K., Couderc, C., … SPIE - The International Society of Optical Engineering	11 国際会議録 Reticle enhancement verification for the 65nm and 45nm nodes [6156-58] Lucas, K., Patterson, K., Boone, R., Miramond, C., Borjon, A., Belledent, J., Toublan, O., Entradas, J., Trouiller, Y. SPIE - The International Society of Optical Engineering
6 国際会議録 Process window OPC verification: dry versus immersion lithography for the 65 nm node [6154-169] Borjon, A., Belledent, J., Trouiller, Y., Lucas, K., Couderc, C., Sundermann, F., Urbani, J. C., Rody, Y., Gardin, G., … SPIE - The International Society of Optical Engineering	12 国際会議録 Evaluation of transparent etch stop layer phase shift mask patterning and comparison with the single trench undercut approach [5992-28] Rody, Y., Martin, P., Couderc, C., Sixt, P., Gardin, C., Lucas, K., Patterson, K., Miramond-Collet, C., Belledent, J., … SPIE - The International Society of Optical Engineering

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