Optimization of multi-step development scheme to improve the critical dimension uniformity
- 著者名:
- Chang, H. ( United Microelectronics Corp. (Taiwan) )
- Lin, B. S. -M. ( United Microelectronics Corp. (Taiwan) )
- Hung, K. -C. ( United Microelectronics Corp. (Taiwan) )
- Fang, S. -P. ( United Microelectronics Corp. (Taiwan) )
- Hsu, T. ( United Microelectronics Corp. (Taiwan) )
- 掲載資料名:
- Data analysis and modeling for process control II : 3-4 March, 2005, San Jose, California, USA
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 5755
- 発行年:
- 2005
- 開始ページ:
- 251
- 終了ページ:
- 259
- 総ページ数:
- 9
- 出版情報:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819457356 [0819457353]
- 言語:
- 英語
- 請求記号:
- P63600/5755
- 資料種別:
- 国際会議録
類似資料:
1
国際会議録
Optimization of multi-pole aperture for via patterning of 90 nm logic devices by KrF lithography
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
Electrochemical Society |
4
国際会議録
Quantification of CD-SEM wafer global charging effect on CD and CD uniformity of 193-nm lithography
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
Electrochemical Society |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |