The impact of illumination on feature fidelity for CPL mask technology

The impact of illumination on feature fidelity for CPL mask technology

著者名:

Kuijten, J. P. ( ASML (Netherlands) )

Verhappen, A. ( ASML (Netherlands) )

Conley, W. ( Freescale Semiconductor (USA) )

van de Goor, S. ( ASML (Netherlands) )

Litt, L. ( Freescale Semiconductor (USA) )

Wu, W. ( Freescale Semiconductor (USA) )

Lucas, K. ( Freescale Semiconductor (USA) )

Roman, B. ( Freescale Semiconductor (USA) )

Kasprowicz, B. ( Photronics (USA) )

Progler, C. ( Photronics (USA) )

Socha, R. ( ASML MaskTools (USA) )

van den Broeke, D. ( ASML MaskTools (USA) )

Wampler, K. ( ASML MaskTools (USA) )

Laidig, T. ( ASML MaskTools (USA) )

Hsu, S. ( ASML MaskTools (USA) )

さらに 10 件

掲載資料名:

Optical microlithography XVIII : 1-4 March, 2005, San Jose, California, USA

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

5754

発行年:

2005

パート:

3

開始ページ:

1557

終了ページ:

1561

総ページ数:

5

出版情報:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819457349 [0819457345]

言語:

英語

請求記号:

P63600/5754

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00014979
シリーズID:	PA00000029
会議名:	SPIE Advanced Lithography : Advances in resist technology and processing
回次:	2005 : 18th
会議開催地:	San Jose, CA, USA
会議開催年:	2005.03.01-2005.03.04
論文注記:	18th Optical microlithography,1-4 March, 2005, San Jose, California, USA

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3 国際会議録 Defect printability in CPL mask technology Kuijten, J.-P., Verhappen, A., Pijnenburg, W., Conley, W., Litt, L.C., Wu, W., Montgomery, P., Roman, B.J., Kasprowicz, … SPIE - The International Society of Optical Engineering	9 国際会議録 Development of a sub-100-nm integrated imaging system using chromeless phase-shifting imaging with very high NA KrF exposure and off-axis illumination Petersen, J.S., Conley, W., Roman, B.J., Litt, L.C., Lucas, K., Wu, W., Van Den Broeke, D.J., Chen, J.F., Laidig, T.L., … SPIE-The International Society for Optical Engineering
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