Assessment of complementary double dipole lithography for 45 nm and 32 nm technologies
- 著者名:
Postnikov, S. V. ( Freescale (France) ) Robert, E. ( STMicroelectronics (France) ) Thony, P. ( CEA-LETI (France) ) Patterson, K. ( Freescale (France) ) Warrick, S. ( Freescale (France) ) Henry, D. ( STMicroelectronlcs (France) ) Torres, A. ( AT Mentor Graphics (USA) ) Toublon, O. ( Mentor Graphics (France) ) - 掲載資料名:
- Optical microlithography XVIII : 1-4 March, 2005, San Jose, California, USA
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 5754
- 発行年:
- 2005
- パート:
- 3
- 開始ページ:
- 1478
- 終了ページ:
- 1484
- 総ページ数:
- 7
- 出版情報:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819457349 [0819457345]
- 言語:
- 英語
- 請求記号:
- P63600/5754
- 資料種別:
- 国際会議録
類似資料:
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
2
国際会議録
OPC optimization for double dipole lithography and its application on 45nm node with dry exposure
Society of Photo-optical Instrumentation Engineers |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
Society of Photo-optical Instrumentation Engineers |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |