Tunable transmission phase mask options for 65/45nm node gate and contact processing
- 著者名:
Kasprowicz, B. S. ( Photronics (USA) ) Conley, W. ( Freescaie Semlconductor (USA) ) Ham, Y.-M. ( Photronics (USA) ) Cangemi, M. J. ( Photronics (USA) ) Morgana, N. ( Photronics (France) ) Cottle, R. ( Photronics (USA) ) Progler, C. J. ( Photronics (USA) ) Wu, W. ( Freescale Semiconductor (USA) ) Litt, L. C. ( Freescale Semiconductor (USA) ) Cobb, J. ( Freescale Semiconductor (USA) ) Roman, B. ( Freescale Semiconductor (USA) ) - 掲載資料名:
- Optical microlithography XVIII : 1-4 March, 2005, San Jose, California, USA
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 5754
- 発行年:
- 2005
- パート:
- 3
- 開始ページ:
- 1469
- 終了ページ:
- 1477
- 総ページ数:
- 9
- 出版情報:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819457349 [0819457345]
- 言語:
- 英語
- 請求記号:
- P63600/5754
- 資料種別:
- 国際会議録
類似資料:
SPIE - The International Society of Optical Engineering |
7
国際会議録
Process, design, and optical proximity correction requirements for the 65-nm device generation
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
8
国際会議録
Process, design and optical proximity correction requirements for the 65nm device generation
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
4
国際会議録
Comparisons of 9% versus 6% transmission attenuated phase-shift mask for the 65-nm device mode
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |