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Sub 90nm DRAM patterning by using modified chromeless PSM at KrF lithography era

著者名:
  • Kim, Y.-S. ( Hynix Semiconductor Inc. (South Korea) )
  • Hyun, Y.-S. ( Hynix Semiconductor Inc. (South Korea) )
  • Kong, K.-K. ( Hynix Semiconductor Inc. (South Korea) )
  • Kim, H. ( Hynix Semiconductor Inc. (South Korea) )
  • Choi, B.-H. ( Hynix Semiconductor Inc. (South Korea) )
掲載資料名:
Optical microlithography XVIII : 1-4 March, 2005, San Jose, California, USA
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
5754
発行年:
2005
パート:
3
開始ページ:
1388
終了ページ:
1394
総ページ数:
7
出版情報:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819457349 [0819457345]
言語:
英語
請求記号:
P63600/5754
資料種別:
国際会議録

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