Development of fluoropolymers tor pellicle in 157nm lithography

Development of fluoropolymers tor pellicle in 157nm lithography

著者名:

Okada, S. ( Asahi-Glass Co., Ltd. (Japan) )

Yamamoto, H. ( Asahi-Glass Co., Ltd. (Japan) )

Matsukura, I. ( Asahi-Glass Co., Ltd. (Japan) )

Shirota, N. ( Asahi-Glass Co., Ltd. (Japan) )

Ishibashi, Y. ( Asahi-Glass Co., Ltd. (Japan) )

Sasaki, H. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )

Higashikawa, I. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )

Wakamiya, W. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )

さらに 3 件

掲載資料名:

Optical microlithography XVIII : 1-4 March, 2005, San Jose, California, USA

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

5754

発行年:

2005

パート:

3

開始ページ:

1320

終了ページ:

1328

総ページ数:

9

出版情報:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819457349 [0819457345]

言語:

英語

請求記号:

P63600/5754

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00014979
シリーズID:	PA00000029
会議名:	SPIE Advanced Lithography : Advances in resist technology and processing
回次:	2005 : 18th
会議開催地:	San Jose, CA, USA
会議開催年:	2005.03.01-2005.03.04
論文注記:	18th Optical microlithography,1-4 March, 2005, San Jose, California, USA

類似資料:

1 国際会議録 Development of fluoropolymer for 193nm immersion lithography [6153-80] Shirota, N, Takebe, Y, Sasaki, T, Yokokoji, O, Toriumi, M, Masuhara, H SPIE - The International Society of Optical Engineering	7 国際会議録 Hard pellicle study for 157-nm lithography Shu, E.Y., Lo, F.-C., Eschbach, F.O., Cotte, E.P., Engelstand, R.L., Lovell, E.G., Okada, K., Kikugawa, S. SPIE-The International Society for Optical Engineering
2 国際会議録 Development of pellicle for F2(157-nm) excimer laser Shigematsu, S., Nakano, T., Shigemoto, H., Kondo, M., Nakagawa, H., Sasaki, H., Higashikawa, I. SPIE-The International Society for Optical Engineering	8 国際会議録 Hard pellicle investigation for 157-nm lithography: impact on overlay Bruls, R., Uitterdijk, T., Cicilia, O., De Bisschop, P., Kocsis, M. K., Grenville, A., Van Peski, C. K., Engelstad, R. … SPIE - The International Society of Optical Engineering
3 国際会議録 Materials design and development of fluoropolymers for use as pellicles in 157-nm photolithography French,R.H., Gordon,J.S., Jones,D.J., Lemon,M.F., Wheland,R.C., Zhang,E., Zumsteg Jr.,F.C., Sharp,K.G., Qiu,W. SPIE-The International Society for Optical Engineering	9 国際会議録 Development of non-topcoat resist polymers for 193-nm immersion lithography N. Shirota, Y. Takebe, S. Wang, T. Sasaki, O. Yokokoji SPIE - The International Society of Optical Engineering
4 国際会議録 Development of hard pellicle for 157 nm Okada, K., Ootsuka, K., Ishikawa, I., Ikuta, Y., Kojima, H., Kawahara, T., Minematsu, T., Mishiro, H., Kikugawa, S., … SPIE-The International Society for Optical Engineering	10 国際会議録 Development of polymer membranes for 157-nm lithography Eschbach, F., Tregub, A., Orvek, K., Foster, C., Lo, F.-C., Matsukura, I., Tsushima, N. SPIE - The International Society of Optical Engineering
5 国際会議録 Fluoropolymer resists for 157-nm lithography Toriumi, M., Shida, N., Watanabe, H., Yamazaki, T., Ishikawa, S., Itani, T. SPIE-The International Society for Optical Engineering	11 国際会議録 Development and evaluation of an F2 laser for immersion interference lithography at 157 nm Itakura, Y., Kawasa, Y., Wakabayashi, O., Moriya, M., Nagai, S., Sumitani, A., Hagiwara, T., Ishimaru, T., Tsuji, S., … SPIE - The International Society of Optical Engineering
6 国際会議録 Selete activity of 157-nm lithography and masks Yoshioka, N., Itani, T., Wakamiya, W. SPIE-The International Society for Optical Engineering	12 国際会議録 Synthesis of novel fluoropolymers for 157-nm photoresists by cyclopolymerization Kodama, S., Kaneko, I., Takebe, Y., Okada, S., Kawaguchi, Y., Shida, N., Ishikawa, S., Toriumi, M., Itani, T. SPIE-The International Society for Optical Engineering

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