Feasibility study of 6 kHz ArF excimer laser for 193 nm immersion lithography
- 著者名:
Hori, T. ( Komatsu Ltd. (Japan) ) Yabu, T. ( Komatsu Ltd. (Japan) ) Ishihara, T. ( Komatsu Ltd. (Japan) ) Watanabe, T. ( Komatsu Ltd. (Japan) ) Wakabayashi, O. ( Komatsu Ltd. (Japan) ) Sumitani, A. ( Komatsu Ltd. (Japan) ) Kakizaki, K. ( Ushio Inc. (Japan) ) Mizoguchi, H. ( Gigaphoton Inc. (Japan) ) - 掲載資料名:
- Optical microlithography XVIII : 1-4 March, 2005, San Jose, California, USA
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 5754
- 発行年:
- 2005
- パート:
- 3
- 開始ページ:
- 1285
- 終了ページ:
- 1292
- 総ページ数:
- 8
- 出版情報:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819457349 [0819457345]
- 言語:
- 英語
- 請求記号:
- P63600/5754
- 資料種別:
- 国際会議録
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4
国際会議録
Highly durable low CoO mass production version of 2-kHz ArF excimer laser for DUV lithography
SPIE - The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
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SPIE - The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
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