Influence of mask induced polarization effects on a pattern printability
- 著者名:
Ishimaru, T. ( Semiconductor Leading Edge Technologies, Inc. (Japan) ) Matsuura, S. ( Semiconductor Leading Edge Technologies, Inc. (Japan) ) Seki, M. ( Semiconductor Leading Edge Technologies, Inc. (Japan) ) Fujii, K. ( Semiconductor Leading Edge Technologies, Inc. (Japan) ) Koizumi, R. ( Canon Inc. (Japan) ) Hakataya, Y. ( Canon Inc. (Japan) ) Moriya, A. ( Canon Inc. (Japan) ) - 掲載資料名:
- Optical microlithography XVIII : 1-4 March, 2005, San Jose, California, USA
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 5754
- 発行年:
- 2005
- パート:
- 1
- 開始ページ:
- 576
- 終了ページ:
- 586
- 総ページ数:
- 11
- 出版情報:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819457349 [0819457345]
- 言語:
- 英語
- 請求記号:
- P63600/5754
- 資料種別:
- 国際会議録
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4
国際会議録
Determination of mask induced polarization effects occurring in hyper NA immersion lithography
SPIE - The International Society of Optical Engineering |
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