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Determination of mask induced polarization effects occurring in hyper NA immersion lithography

著者名:
Huang, W. C. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) )
Lai, C. M. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) )
Luo, B. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) )
Tsai, C. K. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) )
Tsay, C. S. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) )
Lai, C. W. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) )
Kuo, C. C. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) )
Liu, R. G. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) )
Lin, H. T. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) )
Lin, B. J. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) )
さらに 5 件
掲載資料名:
Optical microlithography XVIII : 1-4 March, 2005, San Jose, California, USA
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
5754
発行年:
2005
パート:
1
開始ページ:
543
終了ページ:
554
総ページ数:
12
出版情報:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819457349 [0819457345]
言語:
英語
請求記号:
P63600/5754
資料種別:
国際会議録

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