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Physically based compact models for fast lithography simulation

著者名:
  • Kang, J. ( DongbuAnam Semiconductor Inc. (South Korea) )
  • Kim, J. ( DongbuAnam Semiconductor Inc. (South Korea) )
  • Jung, S. ( DongbuAnam Semiconductor Inc. (South Korea) )
  • Kim, H. ( DongbuAnam Semiconductor Inc. (South Korea) )
  • Kim, K. ( DongbuAnam Semiconductor Inc. (South Korea) )
掲載資料名:
Optical microlithography XVIII : 1-4 March, 2005, San Jose, California, USA
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
5754
発行年:
2005
パート:
1
開始ページ:
537
終了ページ:
542
総ページ数:
6
出版情報:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819457349 [0819457345]
言語:
英語
請求記号:
P63600/5754
資料種別:
国際会議録

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