Modeling of electromagnetic effects from mask topography at full-chip scale

Modeling of electromagnetic effects from mask topography at full-chip scale

著者名:

Borjon, A. ( Philips Semiconductors (France) )

Belledent, J. ( Philips Semiconductors (France) )

Shang, S. D. ( Mentor Graphics Corp. (USA) )

Toublan, O. ( Mentor Graphics Corp. (USA) )

Miramond, C. ( STMicroelectronics (France) )

Patterson, K. ( Freescale Semiconductor (France) )

Lucas, K. ( Freescale Semiconductor (France) )

Couderc, C. ( Philips Semiconductors (France) )

Rody, Y. ( Philips Semiconductors (France) )

Sundermann, F. ( STMicroelectronics (France) )

Urbani, J.-C. ( STMicroelectronics (France) )

Baron, S. ( STMicroelectronics (France) )

Trouiller, Y. ( LETI-CEA (France) )

Schiavone, P. ( LETI-CEA (France) )

さらに 9 件

掲載資料名:

Optical microlithography XVIII : 1-4 March, 2005, San Jose, California, USA

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

5754

発行年:

2005

パート:

1

開始ページ:

498

終了ページ:

505

総ページ数:

8

出版情報:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819457349 [0819457345]

言語:

英語

請求記号:

P63600/5754

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00014979
シリーズID:	PA00000029
会議名:	SPIE Advanced Lithography : Advances in resist technology and processing
回次:	2005 : 18th
会議開催地:	San Jose, CA, USA
会議開催年:	2005.03.01-2005.03.04
論文注記:	18th Optical microlithography,1-4 March, 2005, San Jose, California, USA

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2 国際会議録 High accuracy 65nm OPC verification: full process window model vs. critical failure ORC Amandine Borjon, Jerome Belledent, Shumay D. Shang, Olivier Toublan, Corinne Miramond, Kyle Patterson, Kevin Lucas, … SPIE - The International Society of Optical Engineering	8 国際会議録 Process window OPC verification: dry versus immersion lithography for the 65 nm node [6154-169] Borjon, A., Belledent, J., Trouiller, Y., Lucas, K., Couderc, C., Sundermann, F., Urbani, J. C., Rody, Y., Gardin, G., … SPIE - The International Society of Optical Engineering
3 国際会議録 Investigation of model-based physical design restrictions(Invited Paper) Lucas, K., Baron, S., Belledent, J., Boone, R., Borjon, A., Couderc, C., Patterson, K., Riviere-Cazaux, L., Rody, Y., … SPIE - The International Society of Optical Engineering	9 国際会議録 65nm OPC and design optimization by using simple electrical transistor simulation Trouiller, Y., Devoivre, T., Belledent, J., Foussadier, F., Borjon, A., Patterson, K., Lucas, K., Couderc, C., … SPIE - The International Society of Optical Engineering
4 国際会議録 Improving model-based OPC performance for the 65-nm node through calibration set optimization Patterson, K., Trouiller, Y., Lucas, K., Belledent, J., Borjon, A., Rody, Y., Couderc, C., Sundermann, F., Urbani, J. … SPIE - The International Society of Optical Engineering	10 国際会議録 Evaluation of transparent etch stop layer phase shift mask patterning and comparison with the single trench undercut approach [5992-28] Rody, Y., Martin, P., Couderc, C., Sixt, P., Gardin, C., Lucas, K., Patterson, K., Miramond-Collet, C., Belledent, J., … SPIE - The International Society of Optical Engineering
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6 国際会議録 Through-process window resist modelling strategies for the 65 nm node [5992-46] Borjon, A., Belledent, J., Troullier, Y., Patterson, K., Lucas, K., Couderc, C., Sundermann, F., Urbani, J. -C., Baron, … SPIE - The International Society of Optical Engineering	12 国際会議録 Reticle enhancement verification for the 65nm and 45nm nodes [6156-58] Lucas, K., Patterson, K., Boone, R., Miramond, C., Borjon, A., Belledent, J., Toublan, O., Entradas, J., Trouiller, Y. SPIE - The International Society of Optical Engineering

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