Nanomolecular resists with adamantane core for 193-nm lithography
- 著者名:
Kim, S.-K. ( Hanyang Univ. (South Korea) ) An, I. ( Hanyang Univ. (South Korea) ) Oh, H.-K. ( Hanyang Univ. (South Korea) ) Lee, S. M. ( Seoul National Univ. (Soufh Korea) ) Bok, C. K. ( Hynix Semiconducfor Inc. (South Korea) ) Moon, S. C. ( Hynix Semiconducfor Inc. (South Korea) ) - 掲載資料名:
- Advances in resist technology and processing XXII : 28 February-2 March, 2005, San Jose, California, USA
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 5753(1)
- 発行年:
- 2005
- パート:
- 1
- 開始ページ:
- 603
- 終了ページ:
- 610
- 総ページ数:
- 8
- 出版情報:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819457332 [0819457337]
- 言語:
- 英語
- 請求記号:
- P63600/5753-1
- 資料種別:
- 国際会議録
類似資料:
SPIE - The International Society of Optical Engineering |
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SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
10
国際会議録
PEB sensitivity variation of 193-nm resist according to activation energy of protection groups
SPIE - The International Society of Optical Engineering |
Society of Photo-optical Instrumentation Engineers |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |