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The effects of chemical gradients and photoresist composition on lithographically generated line edge roughness

著者名:
Chapman, G. ( Simon Fraser Univ. (Canada) )
Poon, D. ( Simon Fraser Univ. (Canada) )
Choo, C. ( Simon Fraser Univ. (Canada) )
Tu, Y. ( Simon Fraser Univ. (Canada) )
Dykes, J. ( Simon Fraser Univ. (Canada) )
Wang, J. ( Simon Fraser Univ. (Canada) )
Peng, J. ( Simon Fraser Univ. (Canada) )
Lennard, W. ( The Univ. of Western Ontario (Canada) )
Kavanagh, K. ( Simon Fraser Univ. (Canada) )
さらに 4 件
掲載資料名:
Advances in resist technology and processing XXII : 28 February-2 March, 2005, San Jose, California, USA
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
5753(1)
発行年:
2005
パート:
1
開始ページ:
368
終了ページ:
379
総ページ数:
12
出版情報:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819457332 [0819457337]
言語:
英語
請求記号:
P63600/5753-1
資料種別:
国際会議録

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