Pattern collapse and line width roughness reduction by surface conditioner solutions for 248-nm lithography
- 著者名:
Padmanaban, M. ( AZ Elecfronic Materials (USA) ) Renfkiewicz, D. ( AZ Elecfronic Materials (USA) ) Lee, S. ( AZ Elecfronic Materials (USA) ) Hong, C. ( AZ Elecfronic Materials (USA) ) Lee, D. ( AZ Elecfronic Materials (USA) ) Rahman, D. ( AZ Elecfronic Materials (USA) ) Sakamuri, R. ( AZ Elecfronic Materials (USA) ) Dammel, R. R. ( AZ Elecfronic Materials (USA) ) - 掲載資料名:
- Advances in resist technology and processing XXII : 28 February-2 March, 2005, San Jose, California, USA
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 5753(1)
- 発行年:
- 2005
- パート:
- 1
- 開始ページ:
- 252
- 終了ページ:
- 260
- 総ページ数:
- 9
- 出版情報:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819457332 [0819457337]
- 言語:
- 英語
- 請求記号:
- P63600/5753-1
- 資料種別:
- 国際会議録
類似資料:
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |