0.31k1 ArF lithography for 70-nm DRAM
- 著者名:
Chumanov, G. ( Clemson Univ. (USA) ) Evanoff, D. D. Jr. ( Clemson Univ. (USA) ) Luzinov, I. ( Clemson Univ. (USA) ) Klep, V. ( Clemson Univ. (USA) ) Zdryko, B. ( Clemson Univ. (USA) ) Conley, W. ( Freescale Semiconductor, Inc. and SEMATECH, Inc. (USA) ) Zimmerman, P. ( Intel Corp. (USA) and SEMATECH, Inc. (USA) ) - 掲載資料名:
- Advances in resist technology and processing XXII : 28 February-2 March, 2005, San Jose, California, USA
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 5753(1)
- 発行年:
- 2005
- パート:
- 1
- 開始ページ:
- 230
- 終了ページ:
- 240
- 総ページ数:
- 11
- 出版情報:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819457332 [0819457337]
- 言語:
- 英語
- 請求記号:
- P63600/5753-1
- 資料種別:
- 国際会議録
類似資料:
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9
国際会議録
Comparative study of chromeless and attenuated phase shift mask for 0.3-k1 ArF lithography of DRAM
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |