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Material design for immersion lithography with high refractive index fluid (HIF)

著者名:
Kim, M. ( Hynix Semiconductor Inc. (South Korea) )
Kim, H. ( Hynix Semiconductor Inc. (South Korea) )
Shim, K. ( Hynix Semiconductor Inc. (South Korea) )
Jeon, J. ( Hynix Semiconductor Inc. (South Korea) )
Gil, M. ( Hynix Semiconductor Inc. (South Korea) )
Song, Y. ( Hynix Semiconductor Inc. (South Korea) )
Enomoto, T. ( Nissan Chemical Industries. Ltd. (Japan) )
Sakaguchi, T. ( Nissan Chemical Industries. Ltd. (Japan) )
Nakajima, Y. ( Nissan Chemical Industries. Ltd. (Japan) )
さらに 4 件
掲載資料名:
Advances in resist technology and processing XXII : 28 February-2 March, 2005, San Jose, California, USA
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
5753(1)
発行年:
2005
パート:
1
開始ページ:
10
終了ページ:
19
総ページ数:
10
出版情報:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819457332 [0819457337]
言語:
英語
請求記号:
P63600/5753-1
資料種別:
国際会議録

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