Characterization and modeling of line width roughness (LWR)
- 掲載資料名:
- Metrology, Inspection, and Process Control for Microlithography XIX
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 5752
- 発行年:
- 2005
- 開始ページ:
- 1227
- 終了ページ:
- 1236
- 総ページ数:
- 10
- 出版情報:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819457325 [0819457329]
- 言語:
- 英語
- 請求記号:
- P63600/5752-3
- 資料種別:
- 国際会議録
類似資料:
1
国際会議録
Effect of line-edge roughness (LER) and line-width roughness (LWR) on sub-100-nm device performance
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
Society of Photo-optical Instrumentation Engineers |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
Society of Photo-optical Instrumentation Engineers |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |