90nm technology contact CD performance characterization via ODP scatterometry
- 著者名:
Jeon, B.-T. ( Dongbu-Anam Semiconductor (South Korea) ) Kim, O.-H. ( Dongbu-Anam Semiconductor (South Korea) ) Baik, J.-H. ( Dongbu-Anam Semiconductor (South Korea) ) Ha, J.-H. ( Dongbu-Anam Semiconductor (South Korea) ) Lee, I.-H. ( Dongbu-Anam Semiconductor (South Korea) ) Yang, W.-S. ( Dongbu-Anam Semiconductor (South Korea) ) - 掲載資料名:
- Metrology, Inspection, and Process Control for Microlithography XIX
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 5752
- 発行年:
- 2005
- 開始ページ:
- 140
- 終了ページ:
- 143
- 総ページ数:
- 4
- 出版情報:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819457325 [0819457329]
- 言語:
- 英語
- 請求記号:
- P63600/5752-1
- 資料種別:
- 国際会議録
類似資料:
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
3
国際会議録
Application of scatterometry for CD and profile metrology in 193-nm lithography process development
SPIE-The International Society for Optical Engineering |
Society of Photo-optical Instrumentation Engineers |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
Society of Photo-optical Instrumentation Engineers |
SPIE-The International Society for Optical Engineering |