Novel methodology of employing scatterometry to assess optical proximity correction test pattern

Novel methodology of employing scatterometry to assess optical proximity correction test pattern

著者名:

Asano, M. ( Semiconductor Co., Toshiba Corp. (Japan) )

Koike, T. ( Semiconductor Co., Toshiba Corp. (Japan) )

Mikami, T. ( Semiconductor Co., Toshiba Corp. (Japan) )

Abe, H. ( Semiconductor Co., Toshiba Corp. (Japan) )

Ikeda, T. ( Semiconductor Co., Toshiba Corp. (Japan) )

Tanaka, S. ( Semiconductor Co., Toshiba Corp. (Japan) )

Mimotogi, S. ( Semiconductor Co., Toshiba Corp. (Japan) )

さらに 2 件

掲載資料名:

Metrology, Inspection, and Process Control for Microlithography XIX

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

5752

発行年:

2005

開始ページ:

9

終了ページ:

18

総ページ数:

10

出版情報:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819457325 [0819457329]

言語:

英語

請求記号:

P63600/5752-1

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00014974
シリーズID:	PA00000029
会議名:	SPIE Advanced Lithography : Emerging lithographic technologies
回次:	2005 : 19th
会議開催地:	San Jose, CA, USA
会議開催年:	2005.02.28-2005.03.03

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