Plasma pinch EUV source with particle injection
- 著者名:
Neumann, M. J. ( Univ. of Illinois at Urbana-Champaign (USA) ) Shin, H. ( Univ. of Illinois at Urbana-Champaign (USA) ) Qiu, H. ( Univ. of Illinois at Urbana-Champaign (USA) ) Ritz, E. ( Univ. of Illinois at Urbana-Champaign (USA) ) DeFrees, R. A. ( Univ. of Illinois at Urbana-Champaign (USA) ) Hendricks, M. R. ( Univ. of Illinois at Urbana-Champaign (USA) ) Alman, D. A. ( Univ. of Illinois at Urbana-Champaign (USA) ) Jurczyk, B. E. ( Univ. of Illinois at Urbana-Champaign (USA) ) Ruzic, D. N. ( Univ. of Illinois at Urbana-Champaign (USA) ) Bristol, R. ( Intel Components Research (USA) ) - 掲載資料名:
- Emerging lithographic technologies IX : 1-3 March 2005, San Jose, California, USA
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 5751
- 発行年:
- 2005
- 開始ページ:
- 556
- 終了ページ:
- 562
- 総ページ数:
- 7
- 出版情報:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819457318 [0819457310]
- 言語:
- 英語
- 請求記号:
- P63600/5751-1
- 資料種別:
- 国際会議録
類似資料:
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
9
国際会議録
Experimental results for an addressable xenon microdischarge EUV-source array for HVM lithography
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
Society of Photo-optical Instrumentation Engineers |
Society of Photo-optical Instrumentation Engineers |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |