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Ion beam imprinting system

著者名:
Alman, D. A. ( Univ. of Illinois at Urbana-Champaign (USA) )
Qiu, H. ( Univ. of Illinois at Urbana-Champaign (USA) )
Thompson, K. C. ( Univ. of Illinois at Urbana-Champaign (USA) )
Antonsen, E. L. ( Univ. of Illinois at Urbana-Champaign (USA) )
Spencer, J. B. ( Univ. of Illinois at Urbana-Champaign (USA) )
Hendricks, M. R. ( Univ. of Illinois at Urbana-Champaign (USA) )
Jurczyk, B. E. ( Univ. of Illinois at Urbana-Champaign (USA) )
Ruzic, D. N. ( Univ. of Illinois at Urbana-Champaign (USA) )
Spila, T. ( Univ. of Illinois at Urbana-Champaign (USA) )
Edwards, G. ( SEMATECH (USA) )
Wurm, S. ( SEMATECH (USA) )
Wood, O. ( SEMATECH (USA) )
Bristol, R. ( Intel Corp. (USA) )
さらに 8 件
掲載資料名:
Emerging lithographic technologies IX : 1-3 March 2005, San Jose, California, USA
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
5751
発行年:
2005
開始ページ:
548
終了ページ:
555
総ページ数:
8
出版情報:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819457318 [0819457310]
言語:
英語
請求記号:
P63600/5751-1
資料種別:
国際会議録

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