EPL performance in 65-nm node metallization technology and beyond

EPL performance in 65-nm node metallization technology and beyond

著者名:

Kakutani, Y. ( Univ. of Hyogo (Japan) )

Niibe, M. ( Extreme Ultraviolet Lithography System Development Association (Japan) )

Takase, H. ( Extreme Ultraviolet Lithography System Development Association (Japan) )

Terashima, S. ( Extreme Ultraviolet Lithography System Development Association (Japan) )

Kondo, H. ( Extreme Ultraviolet Lithography System Development Association (Japan) )

Matsunari, S. ( Extreme Ultraviolet Lithography System Development Association (Japan) )

Aoki, T. ( Extreme Ultraviolet Lithography System Development Association (Japan) )

Gomei, Y. ( Extreme Ultraviolet Lithography System Development Association (Japan) )

Fukuda, Y. ( Extreme Ultraviolet Lithography System Development Association (Japan) )

さらに 4 件

掲載資料名:

Emerging lithographic technologies IX : 1-3 March 2005, San Jose, California, USA

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

5751

発行年:

2005

開始ページ:

501

終了ページ:

508

総ページ数:

8

出版情報:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819457318 [0819457310]

言語:

英語

請求記号:

P63600/5751-1

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00014972
シリーズID:	PA00000029
会議名:	SPIE Advanced Lithography : Emerging lithographic technologies
回次:	2005 : 9th
会議開催地:	San Jose, CA, USA
会議開催年:	2005.03.01-2005.03.03

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